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中图分类法:
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TN47-532 版次： |
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题名:
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Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : [ symposium held April 10-12, 2007, San Francisco, California, U.S.A. /] / , |
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出版发行:
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出版地： Cambridge : 出版社： Cambridge University Press, 出版日期： 2014. |
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载体形态:
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358 p. : ill. ; 24 cm. |
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附注:
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"Symposium B, 'Materials, Processes, Integration and Reliability in Advanced Inteconnects for Micro- and Nanoelectronics,' the MRS 'interconnect symposium'," [was] held April 10-12 at the 2007 MRS Spring Meeting in San Francisco, California"--Pref. |
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主题词:
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Interconnects (Integrated circuit technology) |
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主题词:
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Integrated circuits Very large scale integration |
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主题词:
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Microelectronics |
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主题词:
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Nanoelectronics |
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主题词:
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Materials |
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主要责任者:
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, Qinghuang Lin |
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索书号:
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1 |