中图分类法:	TN304-532 版次：
题名:	CMOS gate-stack scaling-- materials, interfaces and reliability implications [ symposium held April 14-16, 2009, San Francisco, california, U.S.A. ] / ,
出版发行:	出版地： Cambridge 出版社： Cambridge University Press 出版日期： 2014
载体形态:	194 p ill 24 cm
附注:	" ... Symposium C, 'CMOS Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications,' held April 14-16 at the 2009 MRS Spring Meeting in San Francisco, California" -- preface.
主题词:	Metal oxide semiconductors, Complementary
主题词:	Metal oxide semiconductors Materials
主题词:	Silicides
主题词:	Gate array circuits
主要责任者:	Demkov, Alexander A.
次要责任者:	Symposium C, "CMOS Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications"
索书号:	1