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中图分类法:
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TN432-532 版次： |
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题名:
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Materials and devices for end-of-roadmap and beyond CMOS scaling [ symposium held April 5-9, 2010, San Francisco, California] / , |
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出版发行:
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出版地： Cambridge 出版社： Cambridge University Press 出版日期： 2014 |
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载体形态:
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162 p ill 24 cm |
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附注:
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"Contains papers presented at Symposium I, 'Materials for End-of-Roadmap Scaling of CMOS Devices' and Symposium J, 'Materials and Devices for Beyond CMOS Scaling' held April 5-9 at the 2010 MRS Spring Meeting in San Francisco, California"--P. ix. |
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主题词:
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Metal oxide semiconductors, Complementary |
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主要责任者:
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Ramanathan, Shriram. |
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次要责任者:
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Symposium J, "Materials and Devices for Beyond CMOS Scaling" |
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索书号:
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1 |